发明名称 METHOD FOR OBTAINING SPUTTERING TARGET FROM ALUMINIUM-BASED ALLOY
摘要 FIELD: metallurgy. ^ SUBSTANCE: aluminium is molten, and then the melt is brought to overheated state at temperature of 1100C. After that, lead, stannum, copper and silicium is introduced subsequently so that alloy can be obtained either with the following composition, wt %: lead 7.4, stannum 0.9, copper 0.4, silicium 3.4, aluminium 87.9, or with the following composition, wt %: lead 9.1, stannum 2.1, copper 1.6, silicium 4.6, aluminium 82.6; the melt is mixed, exposed at overheat temperature of 1100C and drained to horizontal flat mould. The melt hardening in the mould is treated with electric and magnetic crossed fields and cast sputtering target is manufactured. ^ EFFECT: producing the target allowing to obtain thin working layers on treated items and providing improved running-in ability and scoring resistance of working layers without reducing the strength and wear resistance. ^ 1 tbl, 1 ex
申请公布号 RU2446228(C1) 申请公布日期 2012.03.27
申请号 RU20100148889 申请日期 2010.12.01
申请人 UCHREZHDENIE ROSSIJSKOJ AKADEMII NAUK INSTITUT FIZIKI TVERDOGO TELA RAN (IFTT RAN) 发明人 SHTINOV EVGENIJ DMITRIEVICH;GLEBOVSKIJ VADIM GEORGIEVICH;CHASHECHKINA ZHANNETA JUR'EVNA;ISHCHENKO VLADIMIR IVANOVICH;BYVSHEV PETR JAKOVLEVICH
分类号 C22C1/02;C22C21/00;C23C14/34 主分类号 C22C1/02
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