| 发明名称 |
Lithographic apparatus and device manufacturing method |
| 摘要 |
An immersion lithographic apparatus is disclosed in which a gas knife is shaped and a liquid removal device is positioned to improve removal of liquid from the surface of the substrate. |
| 申请公布号 |
US8144305(B2) |
申请公布日期 |
2012.03.27 |
| 申请号 |
US20060436057 |
申请日期 |
2006.05.18 |
| 申请人 |
LEENDERS MARTINUS HENDRIKUS ANTONIUS;TEN KATE NICOLAAS;RIEPEN MICHEL;SHULEPOV SERGEI;ASML NETHERLANDS B.V. |
发明人 |
LEENDERS MARTINUS HENDRIKUS ANTONIUS;TEN KATE NICOLAAS;RIEPEN MICHEL;SHULEPOV SERGEI |
| 分类号 |
G03B27/52 |
主分类号 |
G03B27/52 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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