| 摘要 |
PURPOSE: A stripper composition for photoresist and a method for stripping the photoresist using the same are provided to prevent the abrasion of metal wirings and to be applied to a high temperature-based stripping process based on the low volatility and high boiling point of the composition. CONSTITUTION: A stripper composition for photoresist includes 100 parts by weight of alkanol primary amine-based compound, 10-100 parts by weight of a first compound represented by chemical formula 1, 20-190 parts by weight of alkylene glycol alkyl ether-based compound, 5-300 parts by weight of a polar solvent represented by chemical formula 2, 1-70 parts by weight of a second compound represented by chemical formula 3, and a third compound represented by chemical formula 4. In chemical formula 1, the R1 to the R4 are identical or different and are respectively hydrogen elements, C1 to C3 alkyl groups, C6 to C14 aryl groups, or C7 to C17 alkylaryl groups. In the chemical formula 2, the R5 to R7 are identical or different and are respectively hydrogen element or C1 to C3 alkyl groups. In the chemical formula 3, the R8 to R19 are identical or different are respectively hydrogen elements or C1 to C3 alkyl groups. In the chemical formula 4, the R20 to R22 are identical or different and are respectively hydrogen elements or C1 to C9 alkyl groups; the R23 is a hydrogen element or a methyl group; the X is a hydrogen element or a C1 to C3 alkyl group; the m is a natural number; the n is 0 or a natural number; and the sum of the m and the n is between 3 and 25. |
