发明名称 APPARATUS FOR FURNISHING NITROGEN GAS OF SEMICONDUCTOR FACILITY
摘要 PURPOSE: A nitrogen gas supply device for a semiconductor facility is provided to prevent byproducts from being attached by extensively installing a leading end of a supply pipe in a central axis of a body unit. CONSTITUTION: A body unit(20) is formed in an exhaust line of a vacuum pump and passes exhaust gas through a hollow. A cross axis(24) is formed in an inner wall of the body unit. A leading end of a supply pipe(30) is installed on the upper side of the cross axis and supplies nitrogen gas to the lower side of the cross axis.
申请公布号 KR20120029749(A) 申请公布日期 2012.03.27
申请号 KR20100091777 申请日期 2010.09.17
申请人 SEMI. LINE, INC. 发明人 MIN, BYUNG RONG
分类号 H01L21/02 主分类号 H01L21/02
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