发明名称 |
MANUFACTURING METHOD OF NITRIDE SINGLE CRYSTAL, SEMICONDUCTOR LIGHT EMITTING DEVIDE USING THE SAME, AND MANUFACTURING METHOD OF THE SAME |
摘要 |
PURPOSE: A method for manufacturing a nitride mono-crystal, and a nitride semiconductor light emitting diode using the same are provided to control lattice defects created due to thermal expansion and lattice mismatch by forming a mask layer in the inner side of a semiconductor layer by using grapheme. CONSTITUTION: A first electrical conduction semiconductor layer(22) is formed on a substrate(21). The first electrical conduction semiconductor layer comprises a nitride base layer(22A) and a nitride single crystal layer(22B). An active layer(23) is formed on the first electrical conduction semiconductor layer. A second electrical conduction semiconductor layer(24) is formed on the active layer. A mask layer(25) is formed the nitride base layer and the nitride single crystal layer.
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申请公布号 |
KR20120029276(A) |
申请公布日期 |
2012.03.26 |
申请号 |
KR20100091272 |
申请日期 |
2010.09.16 |
申请人 |
SAMSUNG LED CO., LTD. |
发明人 |
CHUNG, HUN JAE;HWANG, SUNG WON;KIM, MIN HO;SEONG, HAN KYU;LEE, SEONG SUK;CHA, NAM GOO |
分类号 |
H01L21/20;H01L33/00 |
主分类号 |
H01L21/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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