发明名称 MANUFACTURING METHOD OF NITRIDE SINGLE CRYSTAL, SEMICONDUCTOR LIGHT EMITTING DEVIDE USING THE SAME, AND MANUFACTURING METHOD OF THE SAME
摘要 PURPOSE: A method for manufacturing a nitride mono-crystal, and a nitride semiconductor light emitting diode using the same are provided to control lattice defects created due to thermal expansion and lattice mismatch by forming a mask layer in the inner side of a semiconductor layer by using grapheme. CONSTITUTION: A first electrical conduction semiconductor layer(22) is formed on a substrate(21). The first electrical conduction semiconductor layer comprises a nitride base layer(22A) and a nitride single crystal layer(22B). An active layer(23) is formed on the first electrical conduction semiconductor layer. A second electrical conduction semiconductor layer(24) is formed on the active layer. A mask layer(25) is formed the nitride base layer and the nitride single crystal layer.
申请公布号 KR20120029276(A) 申请公布日期 2012.03.26
申请号 KR20100091272 申请日期 2010.09.16
申请人 SAMSUNG LED CO., LTD. 发明人 CHUNG, HUN JAE;HWANG, SUNG WON;KIM, MIN HO;SEONG, HAN KYU;LEE, SEONG SUK;CHA, NAM GOO
分类号 H01L21/20;H01L33/00 主分类号 H01L21/20
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