发明名称 RADIATION-SENSITIVE RESIN COMPOSITION, INTERLAYER INSULATING FILM, METHOD FOR FORMING THE INTERLAYER INSULATING FILM, AND DISPLAY DEVICE
摘要 <p>PURPOSE: A radiation-sensitive resin composition, an interlayer insulating film, a method for forming the interlayer insulating film, and a display device are provided to improve the transparency, the development adhesion, and the relative permittivity of the interlayer insulating film. CONSTITUTION: A radiation-sensitive resin composition includes copolymer, a polymeric unsaturated compound, a radiation-sensitive polymerization initiator, and an organic solvent. The copolymer includes the following: a structural unit is derived from at least one compound selected from a group including (meta)acrylic acid and unsaturated carbonic anhydride; a structural unit is derived from at least one compound selected from a group including (meta)acrylic acid glycidyl, (meta)acrylic acid 3,4-epoxycyclohexymethyl, 4-hydroxybutyl(meta)acrylateglycidylether, and 3-(meta)acryloyloxymetyl-3-ethyloxetane; a structural unit is derived from at least one compound selected from a group including styrene, alpha-methylstyrene, 4-methystyrene, and 4-hydroxystyrene; and a structural unit is derived from at least one compound selected from a group including acrylic acid methyl, (meta)acrylic acid ethyl, (meta)acrylic acid n-propyl, (meta)acrylic acid isopropyl, n-butyl, (meta)acrylic acid sec-butyl, (meta)acrylic acid isobutyl, and (meta)acrylic acid tert-butyl.</p>
申请公布号 KR20120029319(A) 申请公布日期 2012.03.26
申请号 KR20110081196 申请日期 2011.08.16
申请人 JSR CORPORATION 发明人 ICHINOHE DAIGO;YASHIRO TAKAO
分类号 G03F7/004;G02F1/13;G03F7/027 主分类号 G03F7/004
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