摘要 |
<p>A test pattern of an MIM(Metal-Insulator-Metal) capacitor is provided to accurately evaluating characteristics by using a testing single MIM capacitor and a testing array type MIM capacitor. A testing single MIM capacitor is formed on a wafer test region where a device is realized. A testing array type MIM capacitor has the same capacitor value as the testing single capacitor. An outer connecting terminal of a single capacitor via contact line is connected to an electrode of the testing single MIM capacitor. An outer connecting terminal of an array capacitor via contact line is connected to an electrode of the testing array MIM capacitor. The testing single MIM capacitor and the testing array type MIM capacitor are formed with the same depth as an operating MIM capacitor in the device.</p> |