| 摘要 |
PURPOSE: A dose data generation apparatus, a dose data generation method, and a semiconductor device manufacturing method are provided to acquire an approximation function applied to entire surfaces of a measurement region and a virtual measurement region, thereby preventing generation of a diffusion value in a dose amount. CONSTITUTION: A measurement region(R1) and a non-measurement region(R2) are included on a shot region. Virtual measurement regions(V1-V8) excluding the shot region is generated by mirroring dimension measurement data(CD) of the measurement region in 8 directions. Dose data of the measurement region and the non-measurement region is acquired by cutting the shot region(K1) from a calculated measurement region and virtual measurement region. Virtual data is generated by mirroring the dimension measurement data on a region which excludes the shot region. An approximation function applied to entire surfaces of the measurement region and the virtual measurement region is acquired. |
