发明名称 Radiation-Sensitive Resin Composition
摘要 <p>A radiation-sensitive resin composition comprising an acid-labile group-containing resin obtained by living radical polymerization having a specific structure which is insoluble or scarcely soluble in alkali, but becomes alkali soluble by the action of an acid, and a photoacid generator, wherein the ratio of weight average molecular weight to number average molecular weight (weight average molecular weight/number average molecular weight) of the acid-labile group-containing-resin is smaller than 1.5.</p>
申请公布号 KR101119783(B1) 申请公布日期 2012.03.23
申请号 KR20057012118 申请日期 2003.12.24
申请人 发明人
分类号 G03F7/004;C08F4/00;G03F7/039 主分类号 G03F7/004
代理机构 代理人
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