PRIMER AND PATTERN FORMING METHOD FOR LAYER INCLUDING BLOCK COPOLYMER

摘要

Provided are a primer for use in phase separation of a layer formed on a substrate and containing a block copolymer to which a plurality of types of polymers has been bound, and a pattern forming method for the layer containing the block copolymer. The primer is characterized by containing resin components, and in that 20 mol% to 80 mol% of building blocks of the entire resin components are building blocks derived from an aromatic ring-containing monomer. The pattern forming method is characterized by including: a step (1) of forming a layer containing a primer (2) by applying the primer to a substrate (1); a step (2) of forming, on the surface of the layer containing the primer (2), a layer (3) containing a block copolymer to which a plurality of types of polymers has been bound, and then phase-separating the layer (3) containing the block copolymer; and a step (3) of selectively removing, from the layer (3) containing the block copolymer, a layer (3a) containing at least one polymer of the plurality of types of polymers constituting the block copolymer.