| 摘要 |
<p>A pattern formation method in which a photosensitive substrate is illuminated by exposure light from projection optics via a master pattern that has lines and spaces, thereby forming a pattern on said substrate. Said method includes: determining whether or not the cumulative exposure amount needed in a projection region of the projection optics in order to form the aforementioned pattern on the aforementioned substrate falls within a prescribed range; changing the master pattern to a different master pattern that has the same pitch between lines and spaces but a different ratio of line width to space width if the aforementioned cumulative exposure amount does not fall within the prescribed range; using said different master pattern to determine exposure conditions and development conditions; exposing the substrate by means of exposure light shone on the aforementioned projection region under the determined exposure conditions; and developing the substrate under the determined development conditions.</p> |
