发明名称 METHOD OF DRYING SUBSTRATE, AND METHOD OF MANUFACTURING IMAGE DISPLAY APPARATUS USING THE SAME
摘要 <P>PROBLEM TO BE SOLVED: To prevent streaky defects caused by peeling and redepositing of a resist-surface insolubilization layer in an end area of a substrate from occurring. <P>SOLUTION: A method of drying a substrate comprises: supplying a first air flow 4 downwardly in an inclined direction onto the substrate, from an upper blowing portion 2a positioned above a virtual plane 1b including a center plane positioned in a center of a thickness of the substrate 1; supplying a second air flow 5 upwardly in an inclined direction onto the substrate, from a lower blowing portion 2b positioned below the virtual plane, while moving relatively the substrate and the upper and lower blowing portions so that the substrate, from the end area as a front of the substrate, passes between the upper blowing portion and the lower blowing portion; and controlling the first and second air flows such that a velocity component of the second air flow in an upward direction perpendicular to the virtual plane is smaller than a velocity component of the first air flow in a downward direction perpendicular to the virtual plane. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012055835(A) 申请公布日期 2012.03.22
申请号 JP20100202169 申请日期 2010.09.09
申请人 CANON INC 发明人 UTSUMI KAZUNARI
分类号 B05D3/04;B05D7/00;G02F1/13;G03F7/30;H01L21/304 主分类号 B05D3/04
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