METHOD FOR REMOVING PHOTORESIST BY USING ELECTROLYTIC DEGREASE

摘要

PURPOSE: A method for stripping photoresist is provided to completely implement a stripping process and to improve the efficiency of operational processes by omitting the use of a photoresist stripping solution. CONSTITUTION: Photoresist is coated on a conductive material(110) or an insulating material. An exposing process and a developing process are implemented. The photoresist is stripped based on a stripping unit. The stripping unit is based on a current applying technique using electrolytic cleaning. The photoresist is electrodeposition photoresist. The conductive material is a material for manufacturing an electric device mounting board. The electric device is an integrated circuit chip. The board is a lead frame with 30um or less lead pitches. The electrolytic cleaning agent for the electrolytic cleaning includes sodium hydroxide or potassium hydroxide and surfactant.