发明名称 |
METHOD FOR DEPOSITING SILICON-SERIES NANOPARTICLE THIN FILM, SILICON-SERIES NANOPARTICLE THIN FILM, AND APPARATUS FOR DEPOSITING SILICON-SERIES NANOPARTICLE THIN FILM |
摘要 |
<p>PURPOSE: A method for depositing a silicon-series nano particle thin film, a silicon-series nano particle thin film, and a device for depositing a nano particle thin film are provided to combine and deposit silicon-series nano particles in one system, thereby preventing contamination of nano particles from the outside. CONSTITUTION: Silicon-series nano particles are combined. The combined silicon-series nano particles are transferred by pressure. The silicon-series nano particles are deposited by a reaction gas. The inputted reaction gas is dissolved so that a silicon-series thin film is deposited on a substrate.</p> |
申请公布号 |
KR20120028051(A) |
申请公布日期 |
2012.03.22 |
申请号 |
KR20100090012 |
申请日期 |
2010.09.14 |
申请人 |
KOREA INSTITUTE OF ENERGY RESEARCH |
发明人 |
LEE, JEONG CHUL;SONG, JIN SOO;CHO, JUN SIK;PARK, SANG HYUN;KOO, HYE YOUNG;KIM, SEONG BEOM |
分类号 |
H01L31/18;H01L21/20;H01L31/0216;H01L31/042 |
主分类号 |
H01L31/18 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|