发明名称 METHOD FOR DEPOSITING SILICON-SERIES NANOPARTICLE THIN FILM, SILICON-SERIES NANOPARTICLE THIN FILM, AND APPARATUS FOR DEPOSITING SILICON-SERIES NANOPARTICLE THIN FILM
摘要 <p>PURPOSE: A method for depositing a silicon-series nano particle thin film, a silicon-series nano particle thin film, and a device for depositing a nano particle thin film are provided to combine and deposit silicon-series nano particles in one system, thereby preventing contamination of nano particles from the outside. CONSTITUTION: Silicon-series nano particles are combined. The combined silicon-series nano particles are transferred by pressure. The silicon-series nano particles are deposited by a reaction gas. The inputted reaction gas is dissolved so that a silicon-series thin film is deposited on a substrate.</p>
申请公布号 KR20120028051(A) 申请公布日期 2012.03.22
申请号 KR20100090012 申请日期 2010.09.14
申请人 KOREA INSTITUTE OF ENERGY RESEARCH 发明人 LEE, JEONG CHUL;SONG, JIN SOO;CHO, JUN SIK;PARK, SANG HYUN;KOO, HYE YOUNG;KIM, SEONG BEOM
分类号 H01L31/18;H01L21/20;H01L31/0216;H01L31/042 主分类号 H01L31/18
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