发明名称 PROCESS FOR VAPOUR GROWING THIN FILMS
摘要 1282167 Semi-conductors INTERNATIONAL BUSINESS MACHINES CORP 2 Sept 1969 [27 Sept 1968] 43364/69 Heading H1K [Also in Division C7] A semi-conductor ternary film of elements of Groups II and VI is deposited on a crystal 16 by feeding vapours from sources 42, 43, 44 at a temperature which prevents binary growth. The substrate temperature is controlled by a heat sink 32. The substrate may be cleaned by backetching, and may be Hg-Te, Pb-Te, Sn-Te or Cd-Te. The film deposited may be Hg-Cd-Te, Zn-Cd-Te, Zn-Hg-Te, Hg-Cd-Se, Zn-Hg-Se, and Zn-Cd-Se.
申请公布号 GB1282167(A) 申请公布日期 1972.07.19
申请号 GB19690043364 申请日期 1969.09.02
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人
分类号 C30B23/02;C23C14/06;C30B25/02;C30B29/48;H01L21/365 主分类号 C30B23/02
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