| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure device capable of preventing the generation of a warp of a microlens array, fixing a gap between a microlens and a substrate, and exposing a high accurate pattern, in the exposure device for moving the microlens array to the substrate. <P>SOLUTION: A microlens array 4 in which a microlens 4a is two-dimensionally aligned on a rectangular surface, is supported by a microlens array plate 3 with its four sides. The microlens array plate 3 moves in a direction orthogonal to its longitudinal direction, thereby scanning an area to be exposed in a substrate 1 with exposure light. The microlens array plate is provided with a blowoff portion (a porous part 5) for blowing out air downward at a part including at least a center in the longitudinal direction. <P>COPYRIGHT: (C)2012,JPO&INPIT |
