| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure device for film, by which a position of a mask can be accurately set at the start of film exposure and the film can be stably exposed with high exposure accuracy. <P>SOLUTION: An exposure device 1 for film is provided with a pulling mark formation part 13 for forming a pulling mark 2a on a leading end of a supplied film 2, the pulling mark 2a being a standard for an initial position of a mask 12. A detecting part 15 detects a position of the pulling mark 2a in a direction perpendicular to a direction of film movement. Based on this detection result, the position of the mask 2a is adjusted. The pulling mark 2a is formed by, for example, a YAG laser. A detecting part 15 is, for example, a line CCD camera disposed below the mask. <P>COPYRIGHT: (C)2012,JPO&INPIT |
