发明名称 APPARATUS AND METHOD FOR WET PROCESSING SUBSTRATE
摘要 An exemplary wet processing apparatus includes a tank, a conveyor configured for conveying a substrate, and a spraying system. The tank receives a wet processing liquid. The conveyor includes a first conveying portion, a second conveying portion, and a third conveying portion. The first conveying portion is in the tank and conveys the substrate in the wet processing liquid. The second conveying portion is obliquely interconnected between the first and third conveying portions. The third conveying portion conveys the substrate above the wet processing liquid in the tank. The spraying system is above the third conveying portion, sprays the wet processing liquid onto the substrate on the third conveying portion.
申请公布号 US2012067848(A1) 申请公布日期 2012.03.22
申请号 US201113161502 申请日期 2011.06.16
申请人 LIN CHAO-WEN;FOXCONN ADVANCED TECHNOLOGY INC. 发明人 LIN CHAO-WEN
分类号 H05K3/00;C23F1/00;C23F1/08 主分类号 H05K3/00
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