| 摘要 |
<p>Provided is a surface treatment method whereby a textured structure is formed at a high yield on the surface of a semiconductor wafer functioning as the light-receiving surface of a solar cell. A semiconductor wafer is obtained by slicing an ingot grown by means of the Czochralski process. The surface of the wafer, which functions as the light-receiving surface of a solar cell, is coated with a water-soluble polymer solution such as polyvinyl alcohol. Subsequently, the surface of the wafer is subjected to etching treatment in an aqueous alkali solution such as potassium hydroxide.</p> |
