| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a plasma gas generation device capable of expanding a control range of a high-temperature gas flow rate and a temperature. <P>SOLUTION: A plasma gas generation device for generating a high-temperature gas comprises: a cathode gas passage 6 which guides a cathode gas 5 to a cathode opening 7 via a cathode 3 which is provided in a tip of an inner pipe 2 and has the cathode opening 7 in the center of the inner pipe, a floating electrode 4 which is disposed in contact with the rear of the cathode 3 and supplies electrons to the cathode 3, and the portion between the inner pipe 2 and the floating electrode 4; an anode gas passage 10 which supplies an anode gas 9 to an anode opening 11 via an anode 8 which is provided outside the cathode 3 and the inner pipe 2 and has the anode opening 11 which lies downstream of the cathode opening 7, and the portion between the inner pipe 2 and the anode 8; and a dilution gas passage 15 which supplies a dilution gas 14 from a dilution gas supply device 13 via the outside member 12 provided outside the anode 8 and the portion between the outside member 12 and the anode 8. <P>COPYRIGHT: (C)2012,JPO&INPIT |
