CARBAMOYLOXYADAMANTANE DERIVATIVE, POLYMER COMPOUND, AND PHOTORESIST COMPOSITION

摘要

Provided are a novel acrylic acid ester derivative which can be a structural unit of a polymer compound contained in a photoresist composition; the polymer compound which is obtained by polymerization of a starting material containing the acrylic acid ester derivative; and a photoresist composition which contains the polymer compound, has better LWR than in the past, and has a high-resolution resist pattern formed therein. Specifically provided are a carbamoyloxyadamantane derivative which is represented by general formula (1); a polymer compound which is obtained by polymerization of a starting material containing the carbamoyloxyadamantane derivative; and a photoresist composition which contains the polymer compound, a photo acid generator, and a solvent. (In the formula, R is a hydrogen atom, methyl group, or trifluoromethyl group.)