发明名称 EXPOSURE DEVICE AND DEVICE MANUFACTURING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To reduce influence of vibration disturbance caused by driving-reaction force generated when driving a blade as a light shielding means. <P>SOLUTION: An exposure device projecting an original pattern to a substrate via a projection optical system and exposing the original pattern to the substrate by moving the original together with the substrate in a direction perpendicular to optical axis of the projection optical system, includes: X blades 6C and 6D and Y blades 6A and 6B as light shielding means that are provided on a plane conjugate to a surface of the original and limit an exposure amount; an X linear motor and a Y linear motor as driving means that move the light shielding means; a support unit that supports the light shielding means. The driving means has a stator 8A, and includes leaf springs 8E that absorb driving-reaction force of the driving means by using the stator as a counter mass against the support unit, and a stator position control motor 8F. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012060153(A) 申请公布日期 2012.03.22
申请号 JP20110256744 申请日期 2011.11.24
申请人 CANON INC 发明人 MIYAJIMA GIICHI;MEGURO TAKASHI
分类号 H01L21/027;F16F15/02 主分类号 H01L21/027
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