发明名称 METHOD FOR TREATMENT OF COPPER ETCHING WASTE LIQUID
摘要 <P>PROBLEM TO BE SOLVED: To efficiently decompose hydrogen peroxide contained in a copper etching waste liquid at high concentration. <P>SOLUTION: There is provided a method for treating a copper etching waste liquid by adjusting the pH of the waste liquid containing hydrogen peroxide to 4 or more. When the pH of the copper etching waste liquid which has usually pH 3 or less being a strongly acidic liquid is adjusted to 4 or more, a copper-containing SS is generated, and the SS functions as a decomposition catalyst for hydrogen peroxide. Thus, the hydrogen peroxide in the copper etching waste liquid can be efficiently decomposed by only adjusting the pH of the waste liquid to 4 or more without needing dilution or heating nor needing any chemical agent other than an alkaline agent for pH adjustment. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012055825(A) 申请公布日期 2012.03.22
申请号 JP20100201158 申请日期 2010.09.08
申请人 KURITA WATER IND LTD 发明人 NAKAHARA TOSHIJI
分类号 C02F1/58;C02F1/62;C22B3/44;C22B15/00 主分类号 C02F1/58
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