发明名称 PATTERN FOR FOREIGN MATTER DETECTION AND SEMICONDUCTOR DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a pattern for foreign matter detection which can detect existence of foreign matters with high efficiency regardless of the type of foreign matters, and to provide a semiconductor device having such a pattern for foreign matter detection. <P>SOLUTION: The pattern for foreign matter detection has a plurality of L-shaped patterns which are formed on a substrate and from which corners are removed. The plurality of L-shaped patterns from which corners are removed are arranged with a space between one other so that the positions of the removed corners are arranged on a line. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012059998(A) 申请公布日期 2012.03.22
申请号 JP20100203025 申请日期 2010.09.10
申请人 FUJITSU LTD 发明人 KON JUNICHI;NAGATA TAKEO
分类号 H01L21/66;H01L21/822;H01L27/04 主分类号 H01L21/66
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