发明名称 MAGNETIC FIELD GENERATOR, MAGNETRON CATHODE, AND SPUTTERING DEVICE
摘要 <p>The purpose of the present invention is to increase a target usage rate. Provided is a magnetic field generator (10) arranged on the rear surface of a target (8), that generates on the front surface (8a) of the target (8) a magnetic field based on a magnetic line of force (11). The magnetic field generator (10) has: an annular outer periphery magnet body (144) with a pole axis in a direction (X direction) parallel to the surface of the target (8); a center magnet body (142) arranged on the inside of the outer periphery magnet body (144) and with a pole axis in a direction (X direction) parallel to the direction of the pole axis of the outer periphery magnet body (144); a yoke plate (12) that supports the outer periphery magnet body (144) and the center magnet body (142) from the rear surfaces thereof; and a magnetic permeable plate (16) that changes the magnetic field distribution of the surface (8a) of the target (8). The magnetic permeable plate (16) is arranged between the outer periphery magnet body (144) and the center magnet body (142). In addition, the magnetic permeable plate (16) is arranged so as to be supported from the rear surface by the yoke plate (12).</p>
申请公布号 WO2012035970(A1) 申请公布日期 2012.03.22
申请号 WO2011JP69597 申请日期 2011.08.30
申请人 SHINCRON CO., LTD.;UNIVERSITY OF SCIENCE AND TECHNOLOGY OF CHINA;KONG, WEI;LIN, ZIJING;LI, MING;XIE, BIN;WANG, HAIQIAN;JIANG, YOUSONG;NAGAE, EKISHU 发明人 KONG, WEI;LIN, ZIJING;LI, MING;XIE, BIN;WANG, HAIQIAN;JIANG, YOUSONG;NAGAE, EKISHU
分类号 C23C14/35;C03C17/245;C23C14/34 主分类号 C23C14/35
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