CLEANING DEVICE FOR SUBSTRATE AND CLENING METHOD FOR THE SAME

摘要

PURPOSE: A substrate cleaning device and a method thereof are provided to perform alkaline cleaning to eliminate substrate contaminants generated in an etching process, thereby maximizing the cleaning effect. CONSTITUTION: A first cleaning device(300) includes a first supplying unit to supply a first cleaning solution to an etched substrate. A second cleaning device(400) of a second supplying unit supplies a second cleaning solution to the substrate which is cleaned with the first cleaning solution. A third cleaning device(500) of a third supplying unit supplies a third cleaning solution to the substrate which is cleaned with the second cleaning solution. The first and the third cleaning solution are the deionized water, and the second cleaning solution is an alkaline solution.