MASK INSPECTION DEVICE AND EXPOSURE MASK MANUFACTURING DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a mask inspection device capable of detecting phase defect at the stage of mask blank that is a stage before depositing a absorber pattern.

SOLUTION: A mask inspection device 100 includes: an illumination optical system that illuminates illumination light on the surface of mask blank in which a multilayer film for reflecting extreme ultraviolet (EUV) light is formed; sensors 105 and 305 that images an image of the same location as a location to which the light is reflected from the surface of the mask blank at a location in which defocus is performed with a different defocus mount; and a determination part 176 that determines the presence or absence of defect of the mask blank using first and second optical images at the same location on the mask blank surface imaged with the different defocus amount.

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