PROJECTION OBJECTIVE APPLIANCE FOR MICROLITHOGRAPHY, MICROLITHOGRAPHY PROJECTION EXPOSURE APPARATUS HAVING THE SAME, MICROLITHOGRAPHY MANUFACTURING METHOD FOR CONFIGURATION ELEMENT AND CONFIGURATION ELEMENT MANUFACTURED BY USING THE SAME METHOD

摘要

PROBLEM TO BE SOLVED: To solve a problem that a conventional projection objective appliance for use in microlithography includes a stray light component varying over an exposure visual field.

SOLUTION: Variation of the stray light component in the visual field can be reduced by introduction of additional stray light and/or can be adapted to variation of another projection objective appliance. This can be achieved advantageously by adapting in advance or changing surface roughness of a surface in the vicinity of the visual field, and/or by providing a specially targeted optical element having a light scattering characteristic on a pupil plane. Thus, the present invention utilizes observation such that the variation of the stray light component in the visual field and each variation of different stray light components of different projection objective appliances exhibit a bigger problem than the stray light component itself to manufacturers of a semiconductor constituent.

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