| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an antenna unit capable of generating plasma in a state facing a rectangular substrate, and to provide an induction coupling plasma processing apparatus which can perform uniform plasma processing on the rectangular substrate by using the antenna unit. <P>SOLUTION: In the antenna unit including a planar antenna (13a) having a rectangular contour, the antenna (13a) is configured by winding a plurality of antenna wires (61, 62, 63, 64) spirally, as a whole, so that the number of turns at a corner is larger than that in the center of a side in the same plan. The region where the antenna wires are arranged has a frame-shape, and a bend (68) is formed in each antenna wire so that a frame region (67) surrounded by the outer contour line (65) and the inner contour line (66) of the antenna (13a) are line symmetrical with respect to a centerline penetrating two sides of the antenna (13a) facing each other. <P>COPYRIGHT: (C)2012,JPO&INPIT |
