| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an adsorbent for trimethylsilanol having a low desorption rate of trimethylsilanol, a chemical filter carrying the adsorbent, a semiconductor device manufacturing device or a clean room for manufacturing a semiconductor device installed with the chemical filter, and a method of removing trimethylsilanol. <P>SOLUTION: The adsorbent for trimethylsilanol includes activated carbon having a specific surface area obtained by the BET method of 1,350 m<SP POS="POST">2</SP>/g or less and having a bulk density of 0.600 g/ml or more. In the method of removing trimethylsilanol, the activated carbon is brought into contact with exhaust gas of a photolithography process in the manufacture of a semiconductor device. <P>COPYRIGHT: (C)2012,JPO&INPIT |
