| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an allyl ether-based polymer which can exhibit excellent ability to prevent resoiling during washing while having excellent compatibility with a surfactant, and also to provide its manufacturing method. <P>SOLUTION: The allyl ether-based polymer contains, in a specific range, followings having specific structures: (i) a structural unit (a) originated from an allyl ether-based monomer (A); (ii) a structural unit (b) originated from a monomer (B) containing a carboxyl group; and (iii) a structure (c) originated from a compound (C) selected from a bisulfite (salt) (C-1), a hydrogen peroxide (C-2), and a hypophosphorous acid (salt) (C-3). <P>COPYRIGHT: (C)2012,JPO&INPIT |
