| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an allyl ether-based polymer which can exhibit excellent ability to prevent resoiling during washing while having excellent compatibility with a surfactant, and also to provide its manufacturing method. <P>SOLUTION: The allyl ether-based polymer contains, in a specific range, followings having specific structures: (i) a structural unit (a) originated from an allyl ether-based monomer (A); (ii) a structural unit (b) originated from a monomer (B) selected from a monomer (B-1) containing an amino group, a cyclic N-vinyllactam monomer (B-2), a hydroxyalkyl(meth)acrylate monomer (B-3), a (meth)acrylate ester (B-4) having a 1-20C alkyl group, and a carboxylic acid vinyl (B-5). <P>COPYRIGHT: (C)2012,JPO&INPIT |
