ELECTRODE FOR PRODUCING A PLASMA, PLASMA CHAMBER HAVING SAID ELECTRODE, AND METHOD FOR ANALYZING OR PROCESSING A LAYER OR THE PLASMA IN SITU

摘要

The invention relates to an RF electrode for producing a plasma in a plasma chamber, characterized by an optical lead-through. The invention further relates to a plasma chamber, comprising an RF electrode and a counter-electrode having a substrate retainer for accommodating a substrate. For said plasma chamber, a high-frequency alternating field can be developed between the RF electrode and the counter-electrode in order to produce the plasma. The chamber is characterized by an RF electrode having an optical lead-through. The invention further relates to a method for analyzing or processing a layer or a plasma in a plasma chamber in situ. In said method, the layer is arranged on a counter-electrode and an RF electrode is arranged on the side facing the layer. The method is characterized by the selection of an RF electrode having an optical lead-through, and by at least one step, in which electromagnetic radiation is conducted through the optical lead-through for the purpose of analyzing or processing the layer or the plasma, and by at least one further step, in which the scattered or emitted or reflected radiation is fed to an analyzing device.