发明名称 VACUUM PROCESSING DEVICE
摘要 <p>Flow regulating plates (23) for regulating the flow of vent gas supplied from a gas source are disposed facing a substrate (S) in the interior of an unload chamber (16), and inlets (24) for introducing the vent gas into the unload chamber (16) are disposed facing the surface of the flow regulating plates (23).</p>
申请公布号 WO2012036043(A1) 申请公布日期 2012.03.22
申请号 WO2011JP70369 申请日期 2011.09.07
申请人 ULVAC, INC.;IWAI, HARUNORI;KUBO, MASASHI;OTA, ATSUSHI 发明人 IWAI, HARUNORI;KUBO, MASASHI;OTA, ATSUSHI
分类号 H01L21/677;H01L21/205;H01L21/683 主分类号 H01L21/677
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