发明名称 Integrated circuit system with high voltage transistor and method of manufacture thereof
摘要 A method of manufacture of an integrated circuit system includes: providing a semiconductor substrate having an active region, implanted with impurities of a first type at a first concentration; forming an isolation region around the active region; forming a parasitic transistor by applying a gate electrode, implanted with impurities of a second type at a second concentration, over the active region and the isolation region; and applying an isolation edge implant, with the impurities of the first type at a third concentration greater than or equal to the second concentration, for suppressing the parasitic transistor.
申请公布号 US8138051(B2) 申请公布日期 2012.03.20
申请号 US20090488451 申请日期 2009.06.19
申请人 DONG YEMIN;VERMA PURAKH RAJ;ZOU XIN;CHENG CHAO;CHU SHAO-FU SANFORD;GLOBALFOUNDRIES SINGAPORE PTE. LTD. 发明人 DONG YEMIN;VERMA PURAKH RAJ;ZOU XIN;CHENG CHAO;CHU SHAO-FU SANFORD
分类号 H01L21/336;H01L29/76;H01L29/78;H01L29/94;H01L31/119 主分类号 H01L21/336
代理机构 代理人
主权项
地址