发明名称 Semiconductor component and method of manufacture
摘要 A semiconductor component that includes a Schottky device, an edge termination structure, a non-Schottky semiconductor device, combinations thereof and a method of manufacturing the semiconductor component. A semiconductor material includes a first epitaxial layer disposed on a semiconductor substrate and a second epitaxial layer disposed on the first epitaxial layer. The second epitaxial layer has a higher resistivity than the semiconductor substrate. A Schottky device and a non-Schottky semiconductor device are manufactured from the second epitaxial layer. In accordance with another embodiment, a semiconductor material includes an epitaxial layer disposed over a semiconductor substrate. The epitaxial layer has a higher resistivity than the semiconductor substrate. A doped region is formed in the epitaxial layer. A Schottky device and a non-Schottky semiconductor device are manufactured from the epitaxial layer.
申请公布号 US8138033(B2) 申请公布日期 2012.03.20
申请号 US20070746437 申请日期 2007.05.09
申请人 HOSSAIN ZIA;ROBB FRANCINE Y.;VENKATRAMAN PRASAD;SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC 发明人 HOSSAIN ZIA;ROBB FRANCINE Y.;VENKATRAMAN PRASAD
分类号 H01L21/44;H01L27/095;H01L29/76 主分类号 H01L21/44
代理机构 代理人
主权项
地址