发明名称 Method of measuring phase of phase shift mask
摘要 In a method of measuring a phase of a phase shift mask, initial extreme ultraviolet (EUV) light is divided into secondary EUV light portions. The secondary EUV light portions are irradiated onto the phase shift mask as incident EUV light portions, and the phase of the phase shift mask is measured from reflected incident EUV light portions.
申请公布号 US8138483(B2) 申请公布日期 2012.03.20
申请号 US20090489600 申请日期 2009.06.23
申请人 LEE DONG-GUN;KIM SEONG-SUE;SAMSUNG ELECTRONICS CO., LTD. 发明人 LEE DONG-GUN;KIM SEONG-SUE
分类号 G01J1/42;G01J9/02;G03F1/24;G03F1/84 主分类号 G01J1/42
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