PROCESS MONITORING DEVICE AND SEMICONDUCTOR PROCESS APPARATUS WITH THE SAME, AND PROCESS MONITORING METHOD

摘要

PURPOSE: A process monitoring device and a semiconductor process apparatus with the same, and a process monitoring method are provided to monitor a semiconductor manufacturing process regardless of pressure by extending the pressure range of the process monitoring device. CONSTITUTION: A housing(411) comprises an upper wall(411a), a bottom wall(411b), and a sidewall(411c). A plasma unit(420) generates plasma by ionizing a discharge gas. The plasma unit comprises a first electrode(422), a second electrode(424), and a power supply unit(426). The power supply unit applies the power to one of the first electrode and the second electrode. An optical emission spectrum unit(440) analyzes the light of the plasma generated from the plasma unit.