发明名称 Plasma treatment apparatus and plasma treatment method
摘要 A plasma treatment apparatus generates a plasma in a treatment vessel by an electromagnetic wave radiated from an electromagnetic wave radiation portion into the treatment vessel to perform plasma treatment by the plasma. At least a part of a wall constituting the treatment vessel includes at least a part of an electromagnetic wave transmission path which transmits the electromagnetic wave.
申请公布号 US8136479(B2) 申请公布日期 2012.03.20
申请号 US20050081528 申请日期 2005.03.17
申请人 SUGAI HIDEO;IDE TETSUYA;SASAKI ATSUSHI;AZUMA KAZUFUMI;NAKATA YUKIHIKO;SHARP KABUSHIKI KAISHA 发明人 SUGAI HIDEO;IDE TETSUYA;SASAKI ATSUSHI;AZUMA KAZUFUMI;NAKATA YUKIHIKO
分类号 C23C16/511;C23C16/00;C23C16/06;C23C16/22;C23F1/00;H01J37/32;H01L21/00;H01L21/306;H01L21/3065;H05H1/46 主分类号 C23C16/511
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