发明名称 |
Plasma treatment apparatus and plasma treatment method |
摘要 |
A plasma treatment apparatus generates a plasma in a treatment vessel by an electromagnetic wave radiated from an electromagnetic wave radiation portion into the treatment vessel to perform plasma treatment by the plasma. At least a part of a wall constituting the treatment vessel includes at least a part of an electromagnetic wave transmission path which transmits the electromagnetic wave. |
申请公布号 |
US8136479(B2) |
申请公布日期 |
2012.03.20 |
申请号 |
US20050081528 |
申请日期 |
2005.03.17 |
申请人 |
SUGAI HIDEO;IDE TETSUYA;SASAKI ATSUSHI;AZUMA KAZUFUMI;NAKATA YUKIHIKO;SHARP KABUSHIKI KAISHA |
发明人 |
SUGAI HIDEO;IDE TETSUYA;SASAKI ATSUSHI;AZUMA KAZUFUMI;NAKATA YUKIHIKO |
分类号 |
C23C16/511;C23C16/00;C23C16/06;C23C16/22;C23F1/00;H01J37/32;H01L21/00;H01L21/306;H01L21/3065;H05H1/46 |
主分类号 |
C23C16/511 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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