PURPOSE: An apparatus for irradiating plasma having an illumination range of a large area is provided to control a plasma characteristic by diversifying the volume of a discharge space, the size of a hole, the waveform of an applied voltage, and the kind of gas used. CONSTITUTION: A lower plate(100) has an electrode of a stripline type. A lower partition wall maintaining layer(200) is used in order to form a partition wall for securing a plasma discharge space on the lower plate. An internal plate(300) includes a front end part having a gas supply path for supplying gas. The internal plate has the electrode of the stripline type formed on an upper side and lower side of a back end part. An upper partition wall maintaining layer(400) faces the lower partition wall maintaining layer across the internal plate. The upper partition wall maintaining layer is used in order to form the partition wall for securing the plasma discharge space. An upper plate(500) has the electrode of the stripline type.
申请公布号
KR20120026248(A)
申请公布日期
2012.03.19
申请号
KR20100088366
申请日期
2010.09.09
申请人
PUSAN NATIONAL UNIVERSITY INDUSTRY-UNIVERSITY COOPERATION FOUNDATION
发明人
LEE, HAE JUNE;LEE, HO JUN;PARK, CHUNG HOO;KIM, GYOO CHEON;KIM, HYUN KYU;HA, CHANG SEUNG;HWANG, SEOK WON