METHOD AND APPARATUS FOR CLEANING A SUBSTRATE USING NON-NEWTONIAN FLUIDS

摘要

PURPOSE: A method and apparatus for cleaning a substrate using non-newtonian fluids are provided to easily remove photoresist material from the surface of the substrate by combining an ozone combined with a deionized water and an organic photo resist material. CONSTITUTION: A feeding unit is composed in order to receive a non-Newtonian fluid. The non-newtonian fluid has a breakdown point higher than shear stress applied to the non-newtonian fluid. The non-Newtonian fluid is provided to the surface of a substrate. Plug flow is defined by uniform speed flow profile. The speed of the non-Newtonian fluid contacted to the pipe wall is approached to the speed of the non-Newtonian fluid in the middle of the pipe.