发明名称 TREATMENT LIQUID FOR INHIBITING PATTERN COLLAPSE IN MICROSTRUCTURES, AND MICROSTRUCTURE MANUFACTURING METHOD USING SAID TREATMENT LIQUID
摘要 A treatment liquid for inhibiting pattern collapse in microstructures comprising silicon oxide, said treatment liquid containing water and at least one of the following: an ammonium halide that has a fluoroalkyl group; a betaine compound that has a fluoroalkyl group; or an amine oxide compound that has a fluoroalkyl group. Also, a method for manufacturing microstructures comprising silicon oxide, said method using the aforementioned treatment liquid.
申请公布号 WO2012032854(A1) 申请公布日期 2012.03.15
申请号 WO2011JP66156 申请日期 2011.07.14
申请人 MITSUBISHI GAS CHEMICAL COMPANY, INC.;MATSUNAGA, HIROSHI;OHTO, MASARU 发明人 MATSUNAGA, HIROSHI;OHTO, MASARU
分类号 H01L21/304;H01L21/308 主分类号 H01L21/304
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