发明名称 |
TREATMENT LIQUID FOR INHIBITING PATTERN COLLAPSE IN MICROSTRUCTURES, AND MICROSTRUCTURE MANUFACTURING METHOD USING SAID TREATMENT LIQUID |
摘要 |
A treatment liquid for inhibiting pattern collapse in microstructures comprising silicon oxide, said treatment liquid containing water and at least one of the following: an ammonium halide that has a fluoroalkyl group; a betaine compound that has a fluoroalkyl group; or an amine oxide compound that has a fluoroalkyl group. Also, a method for manufacturing microstructures comprising silicon oxide, said method using the aforementioned treatment liquid. |
申请公布号 |
WO2012032854(A1) |
申请公布日期 |
2012.03.15 |
申请号 |
WO2011JP66156 |
申请日期 |
2011.07.14 |
申请人 |
MITSUBISHI GAS CHEMICAL COMPANY, INC.;MATSUNAGA, HIROSHI;OHTO, MASARU |
发明人 |
MATSUNAGA, HIROSHI;OHTO, MASARU |
分类号 |
H01L21/304;H01L21/308 |
主分类号 |
H01L21/304 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|