CLEANING METHOD, DEVICE MANUFACTURING METHOD, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING SYSTEM

摘要

A cleaning method comprises: cleaning the liquid contact member by supplying a first liquid for cleaning to the liquid contact member; recovering the first liquid supplied to the liquid contact member; supplying a second liquid different from the first liquid to the liquid contact member after the liquid contact member is cleaned with the first liquid; recovering the second liquid supplied to the liquid contact member; and performing a process in which a concentration of the first liquid comprised in the recovered second liquid is set to a predetermined concentration or less.