| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide film deposition equipment which can increase its throughput while preventing an excessive increase in number of auxiliary devices and footprint thereof. <P>SOLUTION: Film deposition equipment comprises: a rotary table including 10 or more placing areas, each having a substrate with a diameter of 300 mm placed; a first reaction gas supply section disposed in a first region in a container, for supplying a first reaction gas to the rotary table; a second reaction gas supply section disposed in a second region separated from the first region in a rotational direction of the rotary table, for supplying a second reaction gas to the rotary table; first and second exhaust outlets corresponding to the first region and the second region, respectively; a separation gas supply section disposed between the first region and the second region, for discharging a separation gas for separating the first and second reaction gases; and a separation region including a ceiling surface defining a space in which the separation gas supplied from the separation gas supply section is flowed, between itself and the rotary table, the ceiling surface having a height so that the pressure of the space can be kept higher than that of the pressure in the first region and the second region. <P>COPYRIGHT: (C)2012,JPO&INPIT |
