发明名称 SULFONIUM SALT, PHOTOACID GENERATOR AND PHOTOSENSITIVE RESIN COMPOSITION
摘要 <P>PROBLEM TO BE SOLVED: To provide a sulfonium salt which is highly photosensitive to an i-line. <P>SOLUTION: The sulfonium salt is represented by formula (1) and/or formula (2). [In formula (1) and/or formula (2), R<SP POS="POST">1</SP>to R<SP POS="POST">3</SP>each independently represents alkyl, hydroxy, alkoxy, alkylcarbonyl, arylcarbonyl, alkoxycarbonyl, aryloxycarbonyl, arylthiocarbonyl, acyloxy, arylthio, alkylthio, aryl, heterocyclic hydrocarbon, aryloxy, alkylsulfinyl, arylsulfinyl, alkylsulfonyl, arylsulfonyl, hydroxy(poly)alkyleneoxy, optionally substituted amino, cyano, nitro, or a hologen atom; R<SP POS="POST">4</SP>represents alkyl or aryl; m1, m2 and m3 represent the number of R<SP POS="POST">1</SP>, R<SP POS="POST">2</SP>and R<SP POS="POST">3</SP>, respectively; m1 reprents an integer of 0-5; m2 represents an integer of 0-3; m3 represents an integer of 0-4; and X<SP POS="POST">-</SP>represents a monovalent polyatomic anion]. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012051813(A) 申请公布日期 2012.03.15
申请号 JP20100193471 申请日期 2010.08.31
申请人 SAN APRO KK 发明人 SUZUKI KAZUO;IKEDA TAKUYA;MUKAI TAKAO
分类号 C07D335/16;C07F9/535;C09K3/00;G03F7/004;G03F7/038;G03F7/039 主分类号 C07D335/16
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