METHOD OF ION IMPLANTATION AND SYSTEM THE SAME

摘要

PURPOSE: An ion injection method and apparatus are provided to precisely form ion implantation distribution by adjusting the beam current density distribution of an ion beam feeder. CONSTITUTION: An ion injection apparatus starts a beam starting operation of a plurality of ion beam feeders(50). The ion injection apparatus individually detects beam starting operation completion of a plurality of ion beam feeders(51). The ion injection apparatus sorts the ion beam feeder based on the result of a beam starting operation completion detection process(52). The ion injection apparatus adjusts the beam current density distribution of a ribbon shape ion beam(53). The ion injection apparatus stops the beam starting operation completion detection process.