发明名称 PLASMA TORCH FOR TREATING WASTE AIR OF CHEMICAL VAPOR DEPOSITION PROCESSING
摘要 PURPOSE: A plasma torch for the treatment of waste gas in a chemical vapor deposition process is provided to efficiently decompose fluoride compound included in waste gas by the efficient generation of plasma. CONSTITUTION: A top cover(130) is formed in order to cover the upper end of a cathode electrode(110). A body(140) is placed on the bottom of the top cover. An anode electrode(120) is placed inside the body. The anode electrode comprises an eddy production unit(120a) which is projected inward in order to cover the bottom of the cathode electrode. A first insulation part(150) is placed between the top cover and the body.
申请公布号 KR20120025146(A) 申请公布日期 2012.03.15
申请号 KR20100087349 申请日期 2010.09.07
申请人 UNISEM CO., LTD. 发明人 PARK, SUNG IL;YOON, TAE SANG;LEE, KEUN SOO;KIM, JE HO;KIM, GUN SEOB
分类号 H05H1/34;B23K10/00 主分类号 H05H1/34
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