| 发明名称 |
RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER, AND COMPOUND |
| 摘要 |
A radiation-sensitive resin composition includes a first polymer including a repeating unit represented by a following formula (I). X+ is an onium cation. X+ in the formula (I) is preferably an onium cation represented by a following formula (1-1), an onium cation represented by a following formula (1-2) or a combination thereof.
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| 申请公布号 |
US2012065291(A1) |
申请公布日期 |
2012.03.15 |
| 申请号 |
US201113272523 |
申请日期 |
2011.10.13 |
| 申请人 |
MATSUMURA NOBUJI;NISHIMURA YUKIO;SOYANO AKIMASA;SERIZAWA RYUICHI;OTSUKA NOBORU;TOMIOKA HIROSHI;JSR CORPORATION |
发明人 |
MATSUMURA NOBUJI;NISHIMURA YUKIO;SOYANO AKIMASA;SERIZAWA RYUICHI;OTSUKA NOBORU;TOMIOKA HIROSHI |
| 分类号 |
C08F24/00;C07C69/75;C08F14/18;C08F20/06;C08F28/02;C08L27/12 |
主分类号 |
C08F24/00 |
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