| 发明名称 |
PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME |
| 摘要 |
A photoresist composition and method of forming a pattern using the same are provided. The photoresist composition includes a 60 to 90 wt % novolac resin, a diazide compound, an organic solvent, and an anticorrosive agent. |
| 申请公布号 |
US2012064455(A1) |
申请公布日期 |
2012.03.15 |
| 申请号 |
US201113179106 |
申请日期 |
2011.07.08 |
| 申请人 |
YU DONG-GUK;KIM KI-SOO;LIM HYUN-TAE;SAMSUNG TECHWIN CO., LTD. |
发明人 |
YU DONG-GUK;KIM KI-SOO;LIM HYUN-TAE |
| 分类号 |
G03F7/20;G03F7/004 |
主分类号 |
G03F7/20 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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