发明名称 |
THIN-FILM TRANSISTOR SUBSTRATE, METHOD FOR PRODUCING SAME, AND DISPLAY DEVICE |
摘要 |
<p>An active matrix substrate (20a) is provided with: an insulating substrate (10a); a first thin-film transistor (5a) provided with a first gate electrode (11b) provided on the insulating substrate (10a) and a first oxide semiconductor layer (13a) having a first channel region (Ca); a second thin-film transistor (5b) provided with a second gate electrode (11c) provided on the insulating substrate (10a) and a second oxide semiconductor layer (13B) having a second channel region (Cb); and a second gate insulating film (17) covering the first oxide semiconductor layer (13a) and the second semiconductor layer (13b). Furthermore, third gate electrodes (25) are disposed on the second gate insulating film (17) so as to face the first channel region (Ca) and the second channel region (Cb) through the second gate insulating film (17).</p> |
申请公布号 |
WO2012032749(A1) |
申请公布日期 |
2012.03.15 |
申请号 |
WO2011JP04926 |
申请日期 |
2011.09.02 |
申请人 |
SHARP KABUSHIKI KAISHA;MIYAMOTO, TADAYOSHI |
发明人 |
MIYAMOTO, TADAYOSHI |
分类号 |
H01L29/786;G02F1/1368;G09F9/30;H01L21/28;H01L21/336;H01L21/8238;H01L27/08;H01L27/092 |
主分类号 |
H01L29/786 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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